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Measurement of local optomechanical properties of a direct bandgap 2D semiconductor

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dc.contributor Háskóli Íslands
dc.contributor University of Iceland
dc.contributor.author Benimetskiy, F. A.
dc.contributor.author Sharov, V. A.
dc.contributor.author Alekseev, P. A.
dc.contributor.author Kravtsov, V.
dc.contributor.author Agapev, K. B.
dc.contributor.author Sinev, I. S.
dc.contributor.author Mukhin, I. S.
dc.contributor.author Catanzaro, A.
dc.contributor.author Polozkov, R. G.
dc.contributor.author Alexeev, E. M.
dc.contributor.author Tartakovskii, A. I.
dc.contributor.author Samusev, A. K.
dc.contributor.author Skolnick, M. S.
dc.contributor.author Krizhanovskii, D. N.
dc.contributor.author Shelykh, Ivan
dc.contributor.author Iorsh, I. V.
dc.date.accessioned 2020-03-18T10:58:53Z
dc.date.available 2020-03-18T10:58:53Z
dc.date.issued 2019-10-01
dc.identifier.citation Benimetskiy, F. A., Sharov, V. A., Alekseev, P. A., Kravtsov, V., Agapev, K. B., Sinev, I. S., . . . Iorsh, I. V. (2019). Measurement of local optomechanical properties of a direct bandgap 2D semiconductor. 7(10), 101126. doi:10.1063/1.5117259
dc.identifier.issn 2166-532X
dc.identifier.uri https://hdl.handle.net/20.500.11815/1614
dc.description Publisher's version (útgefin grein).
dc.description.abstract Strain engineering is a powerful tool for tuning physical properties of 2D materials, including monolayer transition metal dichalcogenides (TMDs)—direct bandgap semiconductors with strong excitonic response. Deformation of TMD monolayers allows inducing modulation of exciton potential and, ultimately, creating single-photon emitters at desired positions. The performance of such systems is critically dependent on the exciton energy profile and maximum possible exciton energy shift that can be achieved under local impact until the monolayer rupture. Here, we study the evolution of two-dimensional exciton energy profile induced in a MoSe2 monolayer under incremental local indentation until the rupture. We controllably stress the flake with an atomic force microscope tip and perform in situ spatiospectral mapping of the excitonic photoluminescence in the vicinity of the indentation point. In order to accurately fit the experimental data, we combine numerical simulations with a simple model of strain-induced modification of the local excitonic response and carefully account for the optical resolution of the setup. This allows us to extract deformation, strain, and exciton energy profiles obtained at each indentation depth. The maximum exciton energy shift induced by local deformation achieved at 300 nm indentation reaches the value of 36.5 meV and corresponds to 1.15% strain of the monolayer. Our approach is a powerful tool for in situ characterization of local optomechanical properties of 2D direct bandgap semiconductors with strong excitonic response.
dc.description.sponsorship The authors acknowledge funding from the Ministry of Education and Science of the Russian Federation (Megagrant No. 14.Y26.31.0015, Zadanie No. 3.8891.2017/8.9, and Zadanie No. 3.1365.2017/4.6). I. V. Iorsh acknowledges the support of Grant of President of Russian Federation No. MK-6248.2018.2. A.I.T. and D.N.K. acknowledge UK EPSRC Grant No. EP/P026850/1. V.K. acknowledges support from the Government of the Russian Federation through the ITMO Fellowship and Professorship Program.
dc.format.extent 101126
dc.language.iso en
dc.publisher AIP Publishing
dc.relation.ispartofseries APL Materials;7(10)
dc.rights info:eu-repo/semantics/openAccess
dc.subject Tvívídd
dc.subject Leiðarar (rafmagn)
dc.title Measurement of local optomechanical properties of a direct bandgap 2D semiconductor
dc.type info:eu-repo/semantics/article
dcterms.license All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). https://doi.org/10.1063/1.5117259.
dc.description.version Peer Reviewed
dc.identifier.journal APL Materials
dc.identifier.doi 10.1063/1.5117259
dc.relation.url http://aip.scitation.org/doi/pdf/10.1063/1.5117259
dc.contributor.department Raunvísindastofnun (HÍ)
dc.contributor.department Science Institute (UI)
dc.contributor.school Verkfræði- og náttúruvísindasvið (HÍ)
dc.contributor.school School of Engineering and Natural Sciences (UI)


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